Holographic recording mechanisms of gratings in indium oxide films using 325 nm helium–cadmium laser irradiation |
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| Authors: | C Grivas S Mailis RW Eason E Tzamali NA Vainos |
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| Institution: | (1) Optoelectronics Research Centre (ORC), University of Southampton, Southampton SO17 1BJ, United Kingdom, GB;(2) Foundation for Technology and Research-Hellas (FORTH), Institute of Computer Science (ICS), P.O. Box 1527, 71110 Heraklion, Greece, GR;(3) National Hellenic Research Foundation (NHRF), Theoretical and Physical Chemistry Institute, Engineered Photonic Media Lab, 48 Vassileos Constantinou Avenue, 11635 Athens, Greece, GR |
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| Abstract: | UV (325 nm) holographic recording of gratings in indium oxide films fabricated by reactive pulsed laser deposition has been
investigated as a function of growth temperature, oxygen pressure and angle of incidence of the plasma plume on the substrate.
The influence of the ambient environment (air or vacuum) and the film temperature during recording has also been studied.
Large steady state refractive index changes up to 6×10-3 were observed in layers grown at an oblique angle of 75°. About 77% of the magnitude of these changes residues after thermal
annealing and is attributed to UV-induced permanent structural rearrangements. In contrast, refractive index changes in films
grown at normal incidence were smaller in magnitude and completely reversible.
Received: 30 July 2001 / Accepted: 20 November 2001 / Published online: 23 January 2002 |
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| Keywords: | PACS: 42 40 Eq 42 70 Ln 78 20 81 15 Fg |
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