Characterization of rhenium-silicon thin films |
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| Authors: | J. Thomas Joachim Schumann Wolfram Pitschke |
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| Affiliation: | Institut für Festk?rper- und Werkstofforschung Dresden, Postfach 270016, D-01171 Dresden, Germany, DE
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| Abstract: | Rhenium-silicon thin films have been characterized as promising compounds of thermoelectric applications by means of analytical transmission electron microscopy and X-ray diffraction referring to composition, morphology, short-range order and phase formation. Beyond the discussion of the results some methodical aspects and problems are presented. |
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