ZrO2/ SiO2多层膜的化学法制备研究

 分别以ZrOCl₂·8H₂O 和正硅酸乙酯为原料,采用溶胶-凝胶工艺制备了性能稳定的ZrO₂和SiO₂溶胶。用旋转镀膜法分别在K9玻璃和单晶硅片上制备了ZrO₂/ SiO₂多层膜。采用溶剂替换和紫外光处理等手段,有效地解决了ZrO₂/SiO₂多层膜中膜层开裂和膜间渗透等问题。应用扫描电子显微镜观测了薄膜的表面和剖面微观形貌,并用椭偏仪测得薄膜的厚度和折射率,研究了薄膜厚度、折射率与热处理温度、紫外光处理时间的关系,对所获得薄膜的紫外-可见、红外光谱进行了分析。用输出波长1064nm ,脉宽15ns 的电光调Q光系统产生的强激光进行了单层膜的辐照实验,结果发现溶剂替换后激光损伤阈值有所提高。

Preparation of ZrO2/SiO2 multilayer films via chemical methods

Colloid-based multilayer coatings consisting of alternating layers of high-and low-refractive index components were deposited on K9 glass and silicon wafer substrates by Sol-Gel spin-coating method. SiO2 was used as the low-refractive index component and ZrO2 as the high-refractive index material. The colloidal suspension of ZrO2 was prepared by hydrothermal hydrolysis of ZrOCl2. The solvent in colloidal suspension of SiO2 was replaced by methoxyethanol through distillation. A high-pressure mercury lamp was used to do the irradiation treatment. SEM,IR and UV-VIS spectrophotometer were used to characterize the structure and optical properties of the films. Ellipssometry was used to study the thickness and refractive index of the films. The films were irradiated by a Q-switched Nd:YAG high power laser whose wavelength was 1064 nm and its pulse width was 15 ns. The results show that solvent-exchange and UV-irradiation are effective methods to avoid the cracking in the multilayer films and the infiltrating between the layers and improve laser damage threshold of sol-gel films.