涂胶设备背面冲洗功能的开发与研制

本文根据涂胶设备在加工制品过程中所遇到的制品背面沾污问题，提出改进措施，并根据设备的具体情况，增加了涂胶设备的背面冲洗功能。使制品在涂胶过程中，及时地对制品背面进行冲洗，从而保证了制品背面的洁净度，对提高产品质量和提高产品的成品率有非常重要的意义，同时对开发一些技术要求较高的新品也有深远的影响。

Development of Backside Cleaning Process for Coating Equipment

The wafers are always contaminated on backsides during coating.To add clean function to a coater to keep the backsides of the wafers clear is necessary,that will be helpful to improve the quality and to incresase yields of products,and also,to speed up the development of new products.