| 长波长光敏引发聚合体系 |
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| 引用本文： | 高放,杨永源,冯树京,毛旺民,徐锦棋,李立东. 长波长光敏引发聚合体系[J]. 应用化学, 1999, 16(4): 24-0 |
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| 作者姓名： | 高放 杨永源 冯树京 毛旺民 徐锦棋 李立东 |
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| 作者单位： | 中科院感光化学所，中国科学院感光化学所 |
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| 摘 要： | 香豆素酮染料;双咪唑;染料增感;长波长光敏引发聚合体系
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| 关 键 词： | 香豆素酮染料 双咪唑 染料增感 长波长光敏引发聚合体系 |
| 收稿时间： | 2009-06-29 |
| 修稿时间： | 2009-06-29 |
Study on the Long wavelength Photosensitive Polymerization Systems |
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| Gao Fang ,Yang Yongyuan,Feng Sujing,Mao Wangmin,Xu Jingqi,Li Lidong. Study on the Long wavelength Photosensitive Polymerization Systems[J]. Chinese Journal of Applied Chemistry, 1999, 16(4): 24-0 |
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| Authors: | Gao Fang Yang Yongyuan Feng Sujing Mao Wangmin Xu Jingqi Li Lidong |
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| Affiliation: | Gao Fang *,Yang Yongyuan,Feng Sujing,Mao Wangmin,Xu Jingqi,Li Lidong |
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| Abstract: | Three long wavelength photosensitive initiation systems composed of photosensitizer 3 acetyl 7 N,N diethyl aminocoumarin(KC1), 3 (4 N,N diethylaminocinnamoyl) 7 N,N die thylaminocoumarin (KC2), 3 (4 N,N dimethylaminocinnamoyl) 7 N,N diethylaminocou marin (KC3) respectively with photoinitiator 2 chlorohexaarylbiimidazole( o Cl HABI) and coinitiator n dodecanethiol(SH) have been studied. The relationship between the photopolymerization rate of MMA under visible light and concentration of KC1, o Cl HABI and SH in a system has veen examined by dilatometry. Good images in offset printing was obtained when the studied systems were irradiatied by visible light. |
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| Keywords: | ketocoumarin biimidazole photosensitive polymerization dye sensitization |
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