Initial stage of laser ablation of LiCaAlF6 single crystal under F2 laser irradiation |
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Authors: | Y. Kawaguchi A. Narazaki T. Sato R. Kurosaki H. Niino H. Sato T. Fukuda |
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Affiliation: | (1) Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki, 305-8565, Japan;(2) Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan |
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Abstract: | Initial stage of F2 laser ablation of LiCaAlF6 single crystal was investigated for clarifying the possibility of applying this wide bandgap fluoride crystal to vacuum ultraviolet (VUV) optical components. The ablation threshold, determined by the appearance of line emission from ablated species, was approximately 2 Jcm-2pulse-1, similar to that of VUV grade CaF2 single crystal. The laser-induced damage on the front surface of LiCaAlF6 was faint, though adhesion of aggregated particulates of several microns was observed. PACS 79.20.Ds; 42.70.–a; 78.20.-e; 61.80.Ba; 61.82.Ms |
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