| m线法研究掺杂LiNbO3晶体波导基片的光损伤 |
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| 引用本文： | 许世文 袁菌. m线法研究掺杂LiNbO3晶体波导基片的光损伤[J]. 光子学报, 1994, 23(2): 179-183 |
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| 作者姓名： | 许世文 袁菌 |
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| 作者单位： | 1. 哈尔滨工业大学空间工程系, 哈尔滨, 150006;2. 哈尔滨工业大学应用物理系, 哈尔滨, 150006 |
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| 摘 要： | 采用m线法研究了掺杂LiNbO3晶体波导基片的光损伤,发现抗光损伤能力依次为Mg:LiNbO3、LiNbO3、Fe:LiNbO3(氧化),Fe:LiNbO3(还原).对于同样材料,质子交换光波导的抗光损伤能力高于钛扩散光波导。
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| 关 键 词： | m线法 掺杂LiNbO3波导 光损伤 |
| 收稿时间： | 1993-05-15 |
STUDY OF PHOTO DAMAGE OF WAVEGUIDE SUBSTRATE OF DOPED LiNbO3 BY m-LINE METHOD |
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| Xu Shiwen,Li Minghua,Gao Yuankai,Xu Yuheng,Yuan Yin,Wan Lide. STUDY OF PHOTO DAMAGE OF WAVEGUIDE SUBSTRATE OF DOPED LiNbO3 BY m-LINE METHOD[J]. Acta Photonica Sinica, 1994, 23(2): 179-183 |
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| Authors: | Xu Shiwen Li Minghua Gao Yuankai Xu Yuheng Yuan Yin Wan Lide |
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| Affiliation: | 1. Department of Space Engineering, Harbin Institute of Technology, 150006;2. Department of Applied Physics, Harbin Institute of Technology, 150006 |
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| Abstract: | Photo damage of doped LiNbO3 waveguide was investigated by m-line mothed.It is found that the damage resistance is ordered as Mg:LiNbO3.LiNbOs、Fe:LiNbO3(oxidize)Fe:LiNbO3(reduced).of one kind of material,damage resistance of waveguideby photon exchange is larger than that of Ti-diffuse. |
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| Keywords: | m-line method Doped LiNbO3 waveguide Photo damage |
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