Assessment of laser-induced thermal load on silicon nanostructures based on ion desorption yields |
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Authors: | Bennett N Walker Jessica A Stolee Deanna L Pickel Scott T Retterer Akos Vertes |
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Institution: | (1) Centre for Analytical Bioscience and Laboratory of Biophysics and Surface Analysis, School of Pharmacy, University of Nottingham, Nottingham, NG7 2RD, UK;(2) Clinical Sciences Research Institute, Warwick Medical School, University of Warwick, University Hospital, Clifford Bridge Road, Coventry, CV2 2DX, UK |
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Abstract: | Experimental assessment of the thermal load induced by fast laser pulses on micro- and nanostructures through IR imaging is
currently too slow and lacks the spatial resolution to be useful. In this paper, we introduce a method based on measuring
the laser-induced yields of ions to compare the thermal loads on nanofabricated silicon structures, when exposed to nanosecond
laser pulses. The laser fluences at which the ion yields of, for example, sodiated and potassiated peptides ions are equal
for two different structures correspond to equivalent thermal loads. Using alkalinated peptides is a convenient choice because
the corresponding ion intensities are easily measured up to the melting point of silicon. As an example, we compare the nanosecond
laser heating of silicon nanopost arrays with diverse post diameters and periodicities. Assessment of the thermal load through
ion yield measurements can also be used to verify model assumptions for heat transport regimes in nanostructures. |
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