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Phase formation and structural changes in the chromium-silicon system exposed to compressed plasma fluxes
Authors:V. V. Uglov   N. T. Kvasov   Yu. A. Petukhov   V. M. Astashinskii  A. M. Kuz’minskii
Affiliation:(1) Neocera LLC, 10000 Virginia Manor Road, suite 300, 20705 Beltsville, MD, USA;(2) Neocera, LLC, 10000 Virginia Manor Road #300, Beltsville, MD, USA;(3) Neocera LLC, 10000 Virginia Manor Road, 20705 Beltsville, MD, USA
Abstract:The results of the study of structural and phase transformations in the silicon substrate-chromium coating system exposed to compression plasma fluxes with power densities of 0.3–1.2 GW/m2 are discussed. The formation of hexagonal chromium disilicide and an amorphous phase, the growth of silicon dendrites, and the appearance of a chromium-enriched near-surface layer are revealed effects. The mechanisms of structural and phase transformations caused by rapid cooling of a mixed melt and concentration overcooling during solidification are analyzed.
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