| Ta_2O_5薄膜的低能离子辅助蒸镀 |
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| 引用本文： | 周九林,张苑,杨德利.Ta_2O_5薄膜的低能离子辅助蒸镀[J].光学学报,1988(5). |
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| 作者姓名： | 周九林 张苑 杨德利 |
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| 作者单位： | 西南技术物理研究所
(周九林，张苑)，西南技术物理研究所(杨德利) |
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| 摘 要： | 用低能氧离子辅助蒸镀技术,制备了一系列Ta_2O_5薄膜.观测了薄膜的微结构,测量了薄膜的光吸收和光散射.实验指出,离子束轰击和基片加热同时进行,能够制得透明而匀均的Ta_2O_5薄膜.
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| 关 键 词： | 薄膜微结构 Ta_2O_5薄膜 离子辅助蒸镀 |
Low-energy ion-assisted deposition of Ta_2O_5 films |
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| ZHOU JIuliN,ZHANG WAN ANd YAnG DELI.Low-energy ion-assisted deposition of Ta_2O_5 films[J].Acta Optica Sinica,1988(5). |
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| Authors: | ZHOU JIuliN ZHANG WAN ANd YAnG DELI |
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| Abstract: | A series of Ta2O5 films have been made by low-energy oxygen-ion assisted deposition. The microstructures of the films have been observed. The optical absorptance and scattering have been measnred too. Experiments show that transparent and homogeneous Ta2O5 films can be obtained only if ion bombardment and heating of the substrate are performed simultaneously during deposition. |
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| Keywords: | film microstructure Ta2O5 films ion assisted deposition |
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