The structure of thin carbon films deposited at 13.5 nm EUV irradiation |
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Authors: | E M Malykhin V A Krivchenko D V Lopaev T V Rakhimova S M Zyryanov |
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Institution: | 1.Department of Microelectronics, Institute of Nuclear Physics,Moscow State University,Moscow,Russia |
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Abstract: | In this work, the structure and chemistry of thin nm-thick carbon films deposited on a substrate using strong 13.5 nm EUV
irradiation under a strong vacuum were studied. The film structure was studied by Raman spectroscopy in comparison with the
Raman spectra of well-known carbon phases: diamond, single-wall nanotubes, nano- and micro-crystalline graphite and amorphous
carbon. As well, FTIR spectroscopy was used to study possible IR-active chemical bonds, primarily, hydrogen bonds. It was
shown that films deposited on a surface under EUV irradiation consists of amorphous sp
2-carbon. The mechanisms of deposition are discussed briefly. Knowledge about the structure and chemistry of such carbon films
is very important for EUV lithography. |
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