UBMS技术制备DLC薄膜的光学常数椭偏分析

采用宽光谱变角度椭圆偏振仪对非平衡磁控溅射（UBMS）技术沉积的类金刚石（DLC）薄膜的光学常数进行了测量与分析。在建立模型时，根据DLC薄膜成膜特性，分析和调整了模型结构；综合考虑了表面粗糙度、薄膜与基底表面及界面因素对测试结果的影响，将表面层和界面层分离出来，并采用有效介质方法对它们的影响作了近似处理。结果表明：硅基底上采用UBMS技术制备DLC薄膜的椭偏数据，经该模型拟合后均方误差（MSE值）从37.39下降到4.061，提高了测量精度。

Ellipsometric analysis of optical constants for diamond-like carbon films deposited by UBMS

The optical constants of diamond-like carbon (DLC) films deposited by UBMS were measured and analyzed with a broadband ellipsometer. Based on the models established previously and the analysis on it, the model structure was analyzed and adjusted according to the film forming characteristic of the DLC film. Considering the effects of surface roughness, film surface, substrate surface and interface factors on the measured result, the surface and the DLC film was divided into two layers during modeling because of its graphitization on the surface, and their effects were approximately processed with the effective media approximation (EMA). The results indicate that the ellipsometric data MSE of DLC films deposited on the silicon substrate by UBMS was reduced from 37.39 to 4.061 by this model. The measurement accuracy was improved.