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Ion beam mixing characteristics of MOCVD grown InGaAs/GaAs superlattices
Authors:D V Forbes  J J Coleman  J K Klatt  R S Averback
Institution:(1) Materials Research Laboratory and Microelectronics Laboratory, University of Illinois at Urbana-Champaign Urbana, 61801, IL;(2) Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, 61801 Urbana, IL
Abstract:The ion beam mixing behavior of InGaAs/GaAs strained layer superlattice structures grown by metalorganic chemical vapor deposition was studied using secondary ion mass spectroscopy and Rutherford backscattering channeling. The fluence dependence of intermixing by MeV Kr+ irradiation has been investigated. Significant intermixing occurs for fluences much lower than for similar intermixing in other superlattice systems (i.e. ALAs/GaAs). The intermixing exhibits no temperature dependence for fluences of 2 x 1015 to 5 x 1015 cm−2 which sharply contrasts with the behavior of the AlAs/GaAs superlattice system which shows a strong temperature dependence, including a miscibility gap, in the temperature range 523 to 973K. Samples irradiated at 573K retain a high degree of crystallinity when compared to lower temperature irradiations indicating that the InGaAs/GaAs superlattice can be disordered and still retain crystallinity.
Keywords:InGaAs/GaAs  metalorganic chemical vapor deposition (MOCVD)  Rutherford backscattering (RBS)  secondary ion mass spectroscopy  (SIMS)  superlattice
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