Effects of deposition temperature on the structural and morphological properties of thin ZnO films fabricated by pulsed laser deposition |
| |
| Authors: | Rakhi Khandelwal Amit Pratap Singh Avinashi Kapoor Sorin Grigorescu Paola Miglietta Nadya Evgenieva Stankova Alessio Perrone |
| |
| Institution: | aDepartment of Electronic Science, University of Delhi South Campus, New Delhi 110021, India;bLaser Department, National Institute for Lasers, Plasma and Radiation Physics, P.O. Box MG-36, Bucharest-Magurele RO-77125, Romania;cPhysics Department and INFN, University of Salento, 73100 Lecce, Italy;dInstitute of Electronics, Bulgarian Academy of Sciences, 1784 Sofia, Bulgaria |
| |
| Abstract: | ZnO thin films were grown on Si(1 0 0) substrates using pulsed laser deposition in O2 gas ambient (10 Pa) and at different substrate temperatures (25, 150, 300 and 400 °C). The influence of the substrate temperature on the structural and morphological properties of the films was investigated using XRD, AFM and SEM. At substrate temperature of T=150 °C, a good quality ZnO film was fabricated that exhibits an average grain size of 15.1 nm with an average RMS roughness of 3.4 nm. The refractive index and the thickness of the thin films determined by the ellipsometry data are also presented and discussed. |
| |
| Keywords: | ZnO thin films Si substrate Pulsed laser deposition |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
