AES investigations of Ar+ ion retention in Si during Ar sputtering |
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Authors: | J Kempf |
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Institution: | (1) IBM Germany, D-7000 Stuttgart 80, Fed. Rep. Germany |
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Abstract: | Argon retention in silicon has been studied by AES in the energy range between 1 and 15 keV at bombardment fluences up to
∼1018 ions/cm2. AES data of implanted argon in silicon near the surface region, as obtained during sputtering, can be interpreted qualitatively
by a simple model of ion collection. Discrepancies between calculated and measured saturation values of collected argon ions
indicate that during implantation at high fluences addition surface effects become important and that the simple model of
ion collection has to account for this. Quantitative AES correlated with RBS indicates pronounced concentration gradients
of argon in silicon near surface regions. |
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Keywords: | 79 20 68 20 61 80 |
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