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| X射线光刻现状 | |
| 引用本文： | 袁明文.X射线光刻现状[J].微纳电子技术,1991(4). |
| 作者姓名： | 袁明文 |
| 作者单位： | 机电部第13研究所 石家庄 |
| 摘 要： | 本文介绍x射线光刻的x射线源、光刻机、掩模和抗蚀剂的现状。 |
| 关 键 词： | X射线 光刻 掩模版 |
Present Status of x-Ray Lithography Technology |
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| Yuan Mingwen.Present Status of x-Ray Lithography Technology[J].Micronanoelectronic Technology,1991(4). | |
| Authors: | Yuan Mingwen |
| Abstract: | The present status of the source, stepper, mask and resist for x-ray lithography technology are described, in this paper. |
| Keywords: | x-Ray Lithography Mask |
| 本文献已被 CNKI 等数据库收录！ | |