透射式GaAs光电阴极的X射线衍射研究

本文介绍了高精度多晶多反射X射线衍射仪的一种新的应用.首次将其应用于研究高灵敏度第三代微光象增强器中由掺Zn的p型GaAs/GaAlAs、玻璃组成的光电阴极的材料特性；发展了用倒格子空间衍射图方法评价光电阴级组件晶体质量的方法.通过分析得知,衍射强度在倒格子空间沿。方向展宽主要起因于晶体中的嵌镶效应的增强.文中采用衍射动力学理论的计算方法并忽略初始条件,模拟后得到的曲线与衍射强度沿ω/θ方向的投影强度曲线符合的比较好.粘接良好的阴极样品表明,GaAs/GaAlAs晶格常数的变化基本上可以消除,但粘接引起的嵌镶效应的增强却不能完全消除.

GaAs TRANSMISSION PHOTOCATHODE BY X-RAY DIFFRACTION

This paper presents a new application of high resolution multi-crystal multi-reflection diffractometer (HRMCMRD).For the first time,the HRMCMRD has been used to study the high sensitivity photocathode of the third generation intensify tube,which is Composed of Zn-doping p-type GaAs/ GaAlAs crystal bounded to glass.The reciprocal space mapping has been developed to evaluate the crystal quality of the photocathode.It is shown that the broading of the reciprocal space profilealong ω direction results in the increased mosaic effect.The projected diffraction intensity along ω/2θ direction is accorded with the simulated curve by dynamical diffraction theory and to neglet the initial condition eliminated.Well-bounded photocathode sample suggests that the variation of crystal lattice parameter can almost be eliminated by optimizing the technological process,but the increased mosaic effect can not be eliminated completely.