首页 | 本学科首页   官方微博 | 高级检索  
     


Impact of an Interfacial Layer on the Electrical Performance of p‐Channel Tin Monoxide Field‐Effect Transistors
Authors:Sang Jin Han  Sungmin Kim  Jae Kyeong Jeong  Hyeong Joon Kim
Affiliation:1. Department of Materials Science and Engineering, Seoul National University, Seoul 151‐742, Korea;2. Department of Electronic Engineering, Hanyang University, Seoul 133‐791, Korea
Abstract:
Keywords:field‐effect transistors  p‐type semiconductors  SiOF  SnO
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号