| 电镀及化学镀磁记录介质薄膜的最新进展 |
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| 引用本文： | 安茂忠,杨哲龙.电镀及化学镀磁记录介质薄膜的最新进展[J].电化学,1997,3(1):92-98. |
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| 作者姓名： | 安茂忠 杨哲龙 |
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| 作者单位： | 哈尔滨工业大学应用化学系 |
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| 摘 要： | 本文综述了近年来国外电镀及化学镀磁记录介质薄膜的最新研究进展、电镀及化学镀镀液组成、工艺条件及其对薄膜性能的影响、存在问题及发展方向等．磁记录介质薄膜的制备，过去一直采用溅射方法，近年来国外开展了电镀及化学镀方法制备的研究．电镀方法包括水溶液电镀（如：Ｎｉ－Ｆｅ、Ｆｅ－Ｃｏ合金等）和非水溶液电镀（如Ｔｂ－Ｆｅ、Ｎｄ－Ｆｅ、Ｔｂ－Ｆｅ－Ｃｏ合金等），化学镀则是在Ｎｉ－Ｐ、Ｃｏ－Ｐ合金的基础上，通过添加其它金属盐，得到磁记录介质薄膜，如：Ｃｏ－Ｎｉ－Ｐ、Ｃｏ－Ｗ－Ｐ、Ｃｏ－Ｍｎ－Ｐ、Ｃｏ－Ｎｉ－Ｒｅ－Ｐ合金等
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| 关 键 词： | 电镀 化学镀 磁记录介质薄膜 |
Status of Electroplated and Electroless plated Thin Film Media for Magnetic Recording |
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| An Maozhong,Yang Zhelong,Zhang Jingshuang,Tu Zhenmi.Status of Electroplated and Electroless plated Thin Film Media for Magnetic Recording[J].Electrochemistry,1997,3(1):92-98. |
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| Authors: | An Maozhong Yang Zhelong Zhang Jingshuang Tu Zhenmi |
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| Abstract: | The current study situation for the magnetic recording media films produced by electroplating and electroless plating at aboard was summarized. The bath composition and operating conditions, the properties of the films were introduced. The problem to be solved for extending application of the films was suggested and thd further development was expected. |
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| Keywords: | Electroplating Electroless plating Magnetic recording media films |
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