Computational modeling of forced flow laser chemical vapor deposition

Laser chemical vapor deposition (LCVD) utilizes a laser to localize a CVD reaction. The process involves complex physical interactions within a very small spatial region. Experimental investigations into the dynamics of the LCVD process are limited by spatial and resolution capabilities of instrumentation. Models are developed herein using the computational fluid dynamics (CFD) code, FLUENT, that incorporate heat transfer, fluid flow, and species transport in a single integrated modeling environment. The models are used to study the carbon deposition process. Insight is gained into the relationships among the process parameters and the deposition rates and deposition rate profiles. Phenomena such as thermal diffusion and the relative importance of mass convection and mass diffusion are explored. A designed set of model cases is executed and the results are used to develop a simple polynomial expression for relating experiment conditions to deposit attributes. PACS 81.10.Bk; 81.05.Uw; 81.15.Gh; 47.50.Cd; 81.16.Mk