Morphology and photoluminescence of ultrasmall size of Ge quantum dots directly grown on Si(0 0 1) substrate |
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Authors: | Ke-Fan Wang Yang ZhangWeifeng Zhang |
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Affiliation: | Henan Province Key Laboratory of Photovaltaic Materials, Henan University, Kaifeng 475004, PR China |
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Abstract: | High density and ultrasmall size of Ge quantum dots (QDs) have been achieved directly on Si(0 0 1) (2 × 1) reconstruction surface. Their detailed morphology was observed by atomic force microscope (AFM) and shows that small pyramids, small domes, huts, and multi-headed large domes coexist in the film grown at 400 °C, while small domes and multi-headed large domes formed at 450 °C. Their low temperature photoluminescence (PL) showed that a very strong non-phonon (NP) peak with a large blue shift of 0.19 eV at 14 K, which can be attributed to their very high areal density, 5.2 × 1011 cm−2, and sub-10-nm mean size, 7.6 ± 2.3 nm. |
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Keywords: | Ge quantum dots Molecular beam epitaxy Atomic force microscope Photoluminescence |
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