Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering |
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Authors: | Jyh GwoChun-Lin Chu Ming-Jui TsaiShyong Lee |
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Institution: | a Department of Mechanical Engineering, National Central University, Chung-li, Taiwan b National Nano Device Laboratories, Hsinchu, Taiwan c Institute of Nuclear Energy Research Atomic Energy Council, Tao-Yuan, Taiwan, ROC |
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Abstract: | Ti-containing amorphous hydrogenated carbon (TiC:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C2H2 gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a TiTiCDLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of TiC:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results. |
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Keywords: | High-power pulsed magnetron sputtering Meels-cdn DLC" target="_blank">com/sd/entities/sbnd" class="glyphImg">DLC Diamond-like carbon |
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