Modification of laser induced damage threshold of ZrO2 thin films by using time-temperature gradient annealing |
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| Authors: | Alireza Bananej Amir Hassanpour |
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| Affiliation: | a Laser and Optics Research School, NSTRI, Tehran, Iran
b Department of Physics, Khaje Nasireddine Toosi University of Technology, Tehran, Iran |
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| Abstract: | As a result of using time-temperature gradient annealing, the structural and optical properties and hence, thermal properties of ZrO2 thin films deposited by electron gun, enhanced considerably compared with rapid thermal annealing. Also, it can be seen time- temperature gradient annealing caused to decrease the total stress and number of thermal barrier along the film. Therefore, according to our experimental results, which is agree with theoretical analysis, the laser induced damage threshold of ZrO2 films can be enhanced significantly compared with rapid annealing procedure. |
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| Keywords: | Thin films Laser induced damage threshold Grain size Stress Time-temperature gradient annealing |
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