High diffraction efficiency in SBN with applied fields near the coercive field |
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Authors: | SS Sarvestani A Siahmakoun G Duree K Johnson |
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Institution: | (1) Department of Physics and Applied Optics, Rose-Hulman Institute of Technology, Terre Haute, IN 47803, USA, US;(2) Naval Surface Warfare Center, Crane Division, Crane, IN 47522, USA, US |
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Abstract: | We present the experiments and results of our investigation of electrical fixing in SBN:60. We propose an optical method for
determining the value of the coercive field in ferroelectric crystals. An interferometric method is used to map the change
in the index of refraction with negative applied fields, where the minimum of the index change is an indication of the coercive
field. From this experiment, values of 1.55 kV±20 V for the coercive voltage and 147±6 pm/V for the linear electro-optic coefficient
are found. Two electrical-fixing techniques that result in very high diffraction efficiencies are presented, discussed and
compared to previous publications on electrical fixing in SBN. High diffraction efficiencies of about 95% were achieved with
the application of negative fields near the coercive region, during and after holographic recording in the crystal.
Received: 6 December 2000 / Revised version: 13 February 2001 / Published online: 27 April 2001 |
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Keywords: | PACS: 42 40 Ht 42 70 Mp 77 84 -s |
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