| 13nm投影光刻用激光等离子体软X射线源 |
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| 引用本文： | 林景全,尼启良,陈波,曹健林.13nm投影光刻用激光等离子体软X射线源[J].微细加工技术,1997(4). |
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| 作者姓名： | 林景全 尼启良 陈波 曹健林 |
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| 作者单位： | 中科院长春光机所应用光学国家重点实验室!长春，130022，中科院长春光机所应用光学国家重点实验室!长春，130022，中科院长春光机所应用光学国家重点实验室!长春，130022，中科院长春光机所应用光学国家重点实验室!长春，130022 |
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| 摘 要： | 软X射线投影光刻能够制作出特征线宽小于0．1μm的线条。激光等离子作源的研究是软X射线投影光刻中几项关键技术之一。本文报道了13nm投影光刻用激光等离子体软X射线源。对Sn（Z＝50）靶的激光打靶条件进行初步优化，测定了其在10～20nm波段范围内的辐射相对强度分布。
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| 关 键 词： | 软X射线 投影光刻 激光等离子体 |
LASER-PRODUCED PLASMA SOFT X-RAY SOURCE FOR 13NM PROJECTION LITHOGRAPHY |
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| Lin Jigquan, Ni Qiliag, Chen Bo, Cao Jianlin.LASER-PRODUCED PLASMA SOFT X-RAY SOURCE FOR 13NM PROJECTION LITHOGRAPHY[J].Microfabrication Technology,1997(4). |
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| Authors: | Lin Jigquan Ni Qiliag Chen Bo Cao Jianlin |
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| Institution: | State Key Lab of Applied Optics Changchun Institute of Optics and Fine Mechanics .Academia Sinica Chang chun 130022 |
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| Abstract: | Feature size of less than 0. 1 can be produced using soft X-ray projection lithography(SXPL).One of the key techniques in SXPI, research is the development of compact laser-produced plasma source. The 13nm laser plasma source for SXPL was reported in this paper. Preliminary optimal laser parameters for Sn(Z= 50)target were obtained and the relative radiation strengthin wave-range of 10-20nm were measured. |
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| Keywords: | soft X-ray projection lithography laser-produced plasma source |
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