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Electron photoemission from charged films: absolute cross section for trapping 0-5 eV electrons in condensed CO2
Authors:Michaud M  Hébert E M  Cloutier P  Sanche L
Affiliation:Groupe en Sciences des Radiations, Département de Médecine Nucléaire et Radiobiologie, Faculté de Médecine, Université de Sherbrooke, Sherbrooke, Québec J1H 5N4, Canada.
Abstract:The electron trapping or attachment cross section of carbon dioxide (CO2) condensed as thin films on a spacer of Ar is obtained using a simple model for electron trapping in a molecular film and then charge releasing from the same film by photon absorption. The measurements are presented for different electron exposures and impact energies, film thicknesses, and probing photon energies. The cross section for trapping an electron of incident energy between 0 and 5 eV reveals three different attachment processes characterized by a maximum at about 0.75 eV, a structured feature around 2.25 eV, and a shoulder around 3.75 eV. From the measurement of their dependence with the probing photon energy, the two lowest processes produce traps having a vertical electron binding energy of approximately 3.5 eV, whereas the highest one yields a slightly higher value of approximately 3.7 eV. The 0.75 eV maximum corresponds to the formation of vibrational Feshbach resonances in (CO2)n- anion clusters. The 2.25 eV feature is attributed to the formation of a vibrationally excited 2Piu anion in (CO2)n- clusters, followed by fast decay into its vibrational ground state without undergoing autodetachment. Finally, 3.75 eV shoulder is assigned to the well-known dissociative electron attachment process from 2Piu anion state producing the O- anion in the gas phase and the (CO2)nO- anions in clusters.
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