The electrostatic potentials in an electron-cyclotron-resonance processing plasma |
| |
| Authors: | K. A. Ashtiani J. L. Shohet F. S. B. Anderson D. T. Anderson J. B. Friedmann |
| |
| Affiliation: | (1) Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison, Madison, 53706 Wisconsin;(2) Torsatron/Stellarator Laboratory, University of Wisconsin-Madison, Madison, 53706 Wisconsin |
| |
| Abstract: | The axial distribution of the electrostatic potentials ofan electron-cyclotron resonance (ECR) processing plasma confined in a do magnetic mirror geometry was characterized. The potential profiles far argon and helium at 8.0x 10–4 and 4.0 × 10–4 Torr were measured using electron emissive probes. The experimental measurements were then compared with the predictions of a one-dimensional, electrostatic, particle-in-cell computer code which runs on a personal computer. The potential profiles as predicted by the code showed good agreement with the experimental measurements. |
| |
| Keywords: | Electrostatic potentials electron-cyclotron resonance magnetic mirror emissive probes |
| 本文献已被 SpringerLink 等数据库收录！ |
