| Broad Beam Gas Ion Source with Hollow Cathode Discharge and Four-grid Accelerator System |
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| 引用本文： | TANG Deli PU Shihao HUANG Qi TONG Honghui CUI Xirong Chu Paul K.. Broad Beam Gas Ion Source with Hollow Cathode Discharge and Four-grid Accelerator System[J]. 核工业西南物理研究院年报(英文版), 2006, 0(1): 197-198 |
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| 作者姓名： | TANG Deli PU Shihao HUANG Qi TONG Honghui CUI Xirong Chu Paul K. |
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| 作者单位： | [1]不详 [2]Department of Physic,s and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China |
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| 摘 要： |
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| 关 键 词： | 气体离子源 阴极流量 加速器 核技术 |
Broad Beam Gas Ion Source with Hollow Cathode Discharge and Four-grid Accelerator System |
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| Abstract: | 1 Introduction Ion sources with wide energy and current ranges are used extensively in industrial applications such as ion implantation, etching, and deposition. Broad beam ion sources with a uniform current distributions are needed for many industrial applications and development of commercial ion bean technologies for surface modification of materials is impossible without highly efficient, simple, and dependable ion sources. These and other needs have spurred the development of high efficiency ion sources that can produce ion beams with high energy and current and require low or no maintenance. |
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