Charge-referencing with Xe during XPS sputter profiles |
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| Affiliation: | 1. National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;2. Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300192, China;1. Department of Pharmacology, School of Medicine, Pusan National University, Yangsan 50612, Republic of Korea;2. Department of Microbiology & Immunology, School of Medicine, Pusan National University, Yangsan 50612, Republic of Korea;3. College of Veterinary Medicine and Bio-Safety Research Institute, Chonbuk National University, Iksan, Jeonbuk 54596, Republic of Korea;4. Department of Neurosurgery, Kosin University, College of Medicine, Seo-gu, Busan 49267, Republic of Korea |
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| Abstract: | The charge referencing of spectra in X-ray photoelectron spectroscopy (XPS or ESCA), especially while sputter profiling, is an important part of the determination of the oxidation state of species near the surface. When Xe is used as the sputter gas, the implanted Xe photopeak shifts in parallel with other surface species as the surface charge changes. However, the Xe Auger parameter does not change during these same experiments. These results show that the implanted Xe accurately reflects the static surface charge present on the other atoms of the surface. The Xe photoelectron energy may be used as the basis for charge-referencing the spectra of other elements as the surface is sputter profiled. |
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