Tailoring the wetting response of silicon surfaces via fs laser structuring |
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Authors: | V Zorba E Stratakis M Barberoglou E Spanakis P Tzanetakis C Fotakis |
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Institution: | (1) Institute of Electronic Structure and Laser, Foundation for Research & Technology—Hellas (IESL-FORTH), P.O. Box 1527, Heraklion, 711 10, Greece;(2) Physics Department, University of Crete, Heraklion, 714 09, Greece;(3) Materials Science and Technology Department, University of Crete, Heraklion, 710 03, Greece;(4) Technological Educational Institute of Crete, Heraklion, 71004, Greece |
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Abstract: | Control over the wettability of solids and manufacturing of functional surfaces with special hydrophobic and self-cleaning
properties has aroused great interest because of its significance for a vast range of applications in daily life, industry
and agriculture. We report here a simple method for preparing stable superhydrophobic surfaces by irradiating silicon (Si)
wafers with femtosecond (fs) laser pulses and subsequently coating them with chloroalkylsilane monolayers. It is possible,
by varying the laser pulse fluence on the surface, to achieve control of the wetting properties through a systematic and reproducible
variation of roughness at micro- and nano-scale which mimics both the topology of the “model” superhydrophobic surface—the
natural lotus leaf—, as well as its wetting response. Water droplets can move along these irradiated superhydrophobic surfaces,
under the action of small gravitational forces, and experience subsequent immobilization, induced by surface tension gradients.
These results demonstrate the potential of manipulating liquid motion through selective laser patterning. |
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Keywords: | PACS" target="_blank">PACS 79 20 Ds 68 08 Bc 68 35 Ct 68 35 Np 47 55 Np |
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