Dependence of Auger depth resolution and surface texturing on primary ion species |
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Authors: | M. Tanemura S. Fujimoto F. Okuyama |
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Affiliation: | Department of Systems Engineering, Applied Physics Laboratory, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466, Japan |
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Abstract: | The dependence of Auger depth resolution and surface texturing on primary ion species was systematically investigated for polycrystalline Al, Mo, Ag and Ta films deposited on Si wafers, using 3 keV Ne+, Ar+ and Xe+ ions as projectiles. The resolution was found to depend strongly on ion species; the higher the ion mass, the better the resolution. The resolution improvement attained with Xe+ ions was dramatic for Al, becoming less pronounced for higher mass targets. As revealed by high-resolution scanning electron microscopy, Xe+ sputtering led to less-developed topographical structures of sputtered areas, which allowed us to conclude that ion sputtering with heavier ions roughens the surface less, resulting in a marked improvement in resolution. |
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