Surface functional group effect on atomic force microscope anodization lithography

The lithographic effect of surface chemical functional groups of organic resists on atomic force microscope (AFM) anodization lithography is investigated using mixed self-assembled monolayers (SAMs). The SAM resist films were prepared with 1,12-diaminododecane dihydrochloride (DAD.2HCl), n-tridecylamine hydrochloride (TDA.HCl), and 1,12-diaminododecane hydrochloride (DAD.HCl), and their film characteristics were evaluated by ellipsometry, zeta-potential measurements, and AFM. The lithographic results indicate that the most dominant factor of the surface functional group effect is the electrochemical property of the surface groups as an anode surface in the anodization reaction, and the dimensions of the protruded patterns are critically determined by the wetting property of the resist surface. By controlling the surface chemical groups with considerations of their effects, high-speed patterning at 2 mm/s was achieved successfully using the mixed SAM resist of DAD.2HCl and TDA.HCl.