Zur Tiefenverteilung der durch Elektronenstoß angeregten charakteristischen Röntgenstrahlung von Bor,Kohlenstoff, Aluminium und Silber |
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Authors: | L. Hoffmann Dipl.-Phys G. Wiech E. Zöpf |
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Affiliation: | 1. Sektion Physik der Universit?t München, Deutschland 2. Siemens AG, Forschungslabor, 8000, München
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Abstract: | The peak intensity of the X-ray emission bands of boron (BK; 67 Å), carbon (CK; 44 Å), aluminium (AlL 2,3; 171 Å), and silver (AgMζ; 40 Å) excited by electron bombardment of evaporated targets has been measured as a function of the thickness of the target and at several accelerating voltages in the range 1 to 4 kV. The electron beam was inclined at an angle of 50° to the surface of the target; the take-off angle for the radiation was about 20°. From these measurements one obtaines the thickness of layers effective in producing X-rays. The influence of surface contamination and oxide layers on the intensity distribution of emission bands is discussed. It is then shown that the effect of anode self-absorption can be evaluated, if the absorption coefficientμ(λ) is available. As an example theL 3/L 2 intensity ratio of aluminium, and an averaged depth of X-ray production are calculated; moreover data for the electron range are given and compared with earlier results. Finally the BK-emission band of evaporated boron is presented. |
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