| 二次发射微波电子枪的倍增特性 |
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| 引用本文： | 孙红兵,裴元吉,谢爱根,王荣.二次发射微波电子枪的倍增特性[J].强激光与粒子束,2004,16(11):1477-1480. |
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| 作者姓名： | 孙红兵 裴元吉 谢爱根 王荣 |
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| 作者单位： | 中国科学技术大学 国家同步辐射实验室，安徽 合肥 230029 |
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| 基金项目： | 中科院创新工程资助课题 |
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| 摘 要： | 利用3DRun程序通过数值模拟计算，对二次发射微波电子枪的束流倍增特性作了研究。用1维模型计算了束流倍增与腔两极间距离以及腔中场强的关系，并详细给出了腔两极间距离为10mm,场强为5-4MV/m时出射电子纵向聚束及能量聚焦过程；利用3DRun程序研究了在高频场及粒子束本身空间电荷场的共同作用下，束流在3维运动过程中的倍增特性，计算了出射束流的发射度。通过计算表明：二次发射微波电子枪可以提供低发射度、高流强的电子束。
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| 关 键 词： | 二次发射 微波电子枪 3维运动 空间电荷力 |
| 文章编号： | 1001-4322(2004)11-1477-04 |
| 收稿时间： | 2004/3/8 |
| 修稿时间： | 2004年3月8日 |
Multiplication effect of the secondary emission microwave electron gun |
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| SUN Hong-bing,PEI Yuan-ji,XIE Ai-gen,WANG Rong.Multiplication effect of the secondary emission microwave electron gun[J].High Power Laser and Particle Beams,2004,16(11):1477-1480. |
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| Authors: | SUN Hong-bing PEI Yuan-ji XIE Ai-gen WANG Rong |
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| Institution: | National Synchrotron Radiation Laboratory, University of Science and Technology of China,P.O.Box 6022, Hefei 230029, China |
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| Abstract: | Using the primary program 3DRun given by code VC++, multiplication effect of secondary emission microwave electron gun(SEMEG) is investigated. The relation between multiplication effect and length of cavity and electric field in the gun is studied with one-dimension simulation. The Longitudinal bunching and energy focusing of out electrons is calculated in detail at 10mm length of cavity and 5.4MV/m electric field in the gun. The beam dynamics with space charge effect is also investigated with 3DRun. The emittance of out beam is calculated. With simulation and analysis, it is proved that SEMEG can provide high-current, low-emittance electron pulse. |
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| Keywords: | Secondary emission Microwave electron gun Three-dimensional movement Space charge effect |
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