Chemical Investigation on Various Aromatic Compounds Polymerization in Low Pressure Helium Plasma |
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Authors: | Mihai Asandulesa Ionut Topala Yves-Marie Legrand Stephanie Roualdes Vincent Rouessac Valeria Harabagiu |
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Affiliation: | 1. Petru Poni Institute of Macromolecular Chemistry, 41A Grigore Ghica Voda Alley, 700487, Iasi, Romania 2. Faculty of Physics, Iasi Plasma Advanced Research Center (IPARC), Alexandru Ioan Cuza University of Iasi, 11 Carol I Boulevard, 700506, Iasi, Romania 3. UMR 5635 (CNRS-ENSCM-UMII), Institut Européen des Membranes, Place Eugène Bataillon CC047, 34095, Montpellier Cedex 5, France
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Abstract: | Remarkable properties of plasma polymer films are greatly dependent not only on the chemical structure of precursor but also on the reactor design and the deposition conditions. In many industrial applications it is a challenge to control the plasma polymer structure. In this paper we investigate the chemical transformation of various aromatic compounds, such as activation and fragmentation of substituent-part, aromatic ring opening, during plasma polymerization process. Polymerized films are deposited in a low-frequency capacitively coupled plasma-enhanced chemical vapour deposition reactor, working at low pressure. The chemical composition of plasma-polymerized films is elucidated by Fourier-transform infrared spectroscopy, solid-state carbon-13 nuclear magnetic resonance spectroscopy, and X-ray photoelectron spectroscopy. Based on spectroscopic measurements, the intermediary reactions during film growth may be presumed. |
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