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LiB3O5晶体946nm,473nm倍频增透膜的研制
引用本文:于爱芳,范飞镝,刘中星,朱镛,陈创天.LiB3O5晶体946nm,473nm倍频增透膜的研制[J].人工晶体学报,2006,35(5):917-921.
作者姓名:于爱芳  范飞镝  刘中星  朱镛  陈创天
作者单位:中国科学院理化技术研究所,人工晶体研究与发展中心,北京,100080;中国科学院研究生院,北京,100039;中国科学院理化技术研究所,人工晶体研究与发展中心,北京,100080
基金项目:863项目(No.2002AA311050)资助
摘    要:采用离子辅助沉积技术在LiB3O5晶体上制备了946nm,473nm倍频增透膜,并测量了薄膜的性质.测试结果表明, 该增透膜具有较低的剩余反射、高的环境稳定性和良好的附着力.进一步测量了薄膜在波长1064nm多脉冲辐照下的激光损伤阈值,获得了两种不同的损伤形貌,并对损伤原因作了初步的探讨.此工艺下镀制的LiB3O5晶体用于瓦级全固态蓝光激光器,获得了3.8W波长为473nm的连续蓝光输出.

关 键 词:LiB3O5晶体  倍频增透膜  离子辅助沉积  附着力  激光损伤阈值  蓝色激光器  
文章编号:1000-985X(2006)05-0917-05
收稿时间:03 24 2006 12:00AM
修稿时间:2006-03-24

Study and Manufacture of Frequency Doubling Antireflection Coating at 946nm and 473nm for LiB3O5 Crystal
YU Ai-fang,FAN Fei-di,LIU Zhong-xing,ZHU Yong,CHEN Chuang-tian.Study and Manufacture of Frequency Doubling Antireflection Coating at 946nm and 473nm for LiB3O5 Crystal[J].Journal of Synthetic Crystals,2006,35(5):917-921.
Authors:YU Ai-fang  FAN Fei-di  LIU Zhong-xing  ZHU Yong  CHEN Chuang-tian
Institution:1. Beijing Center for Crystal Research and Development, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences Beijing 100080, China; 2. Graduate School of the Chinese Academy of Sciences, Beijing 100039 ,China
Abstract:Frequency doubling antireflection coatings at 946nm and 473nm were deposited for LiB_3O_5 crystal with ion assisted deposition.The measurement indicates the coatings have low residual reflection,good adhesion and high environmental stability.Laser induce damage threshold by multiple-shot irradiation at 1064nm was studied and two typical damage morphologies were obtained.LBO devices coated on both facets with ion assisted deposition are satisfied with the use for CW Watt-level All-solid-state 473nm blue laser.The maximum laser output power of 3.8W has been achieved at 39W of pump power.
Keywords:LiB_3O_5 crystal  frequency doubling antireflection coating  ion assisted deposition  adhesion  laser damage threshold  blue laser
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