|
|||||
|
|
On the role of ion bombardment parameters in AES sputter depth profiling of Ta2O5/Ta with Ar+ and Xe+ |
|
| Authors: | J. Scholtes H. Oechsner |
| Affiliation: | 1. Fachbereich Physik der Universit?t Kaiserslautern, Erwin-Schr?dinger-Strasse, D-6750, Kaiserslautern, Federal Republic of Germany |
| Abstract: | |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |