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Low Temperature Dry Etching of Graphite Anodes in Hydrogen Glow Discharges |
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| Authors: | J. Nawra S. Pfau A. Resztak Th. Richter A. Rutscher |
| Abstract: | To discribe the temperature dependence of the etching rate of graphite in a hydrogen glow discharge a model is discussed taking into accout the transition from CH4 to CH as the main etching product with increasing temperature. |
| Keywords: | |