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PMN-PT thin films grown by sputtering on silicon substrate: influence of the annealing temperature on the physico-chemical and electrical properties of the films
Authors:D. Rémiens  M. Detalle  R. Herdier  C. Soyer  Genshui Wang  David Jenkins  Pascal Roussel
Affiliation:1. IEMN-DOAE-MIMM UMR CNRS 8520, Université de Valenciennes et du Hainaut-Cambrésis, Le mont houy, 59313, Valenciennes Cedex 9, France
2. Laboratory for Ferroelectric Ceramics and Application, Research Centre for Information Functional Materials and Devices, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, 200050, Shanghai, China
3. Centre for Research in Information Storage Technology, University of Plymouth, Drake Circus, PL4 8AA, Plymouth, UK
4. Laboratoire de Cristallochimie et Physico-chimie du Solide, Université Sciences et Techniques de Lille, BP 90108, Villeneuve d’Ascq Cedex, France
Abstract:Studies of piezoelectric and electrostrictive properties of (1?x)PMN-xPT thin films were carried out. We have chosen the compositions 90/10 and 70/30, which exhibit, respectively, mostly electrostrictive and piezoelectric behaviour in bulk material. Annealing temperature effects on PMN-PT structural, dielectric, ferroelectric and electromechanical properties have been investigated. We demonstrate that with conventional annealing the pure perovskite phase can be obtained at very low temperature (400°C) without any pyrochlore phase for the two compositions. We show that electromechanical response is a mix between electrostrictive and piezoelectric response for the two compositions. However, as can be easily understood, piezoelectric contribution is larger for 70/30. It is shown that electrical responses of the films obtained at 400°C are largely satisfied for many applications; for higher annealing temperature we observe an enhance of the electrical properties due to an improvement of the material quality in terms of crystalline structure.
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