X-ray diffraction study of silicon single crystals highly doped with boron

The section Lang method of X-ray diffraction topography in combination with X-ray diffractometry based on the Borrmann effect was previously shown to be effective for detection of cluster formation during the growth process of highly doped Si-Cz single crystals. In the present work, the same techniques have been used to choose the best condition of technological heat treatment of boron-doped silicon from the view-point of formation of microdefects. The concentration and average size of dislocation loops have been calculated for two conditions of standard heat treatment from the analysis of diffusion scattering. The distribution of dislocation loops along the growth axis and crystal diameter has been determined as well.