| 射频溅射功率对ZnO透明导电薄膜光电性能的影响 |
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| 引用本文： | 陈肖静,王永谦,朱拓,李果华,张光春.射频溅射功率对ZnO透明导电薄膜光电性能的影响[J].人工晶体学报,2009,38(2):354-357. |
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| 作者姓名： | 陈肖静 王永谦 朱拓 李果华 张光春 |
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| 作者单位： | 江南大学理学院,无锡,214122;尚德太阳能电力有限公司研发中心,无锡,214082;尚德太阳能电力有限公司研发中心,无锡,214082;江南大学理学院,无锡,214122;江苏省光伏工程技术中心,无锡,214082;江苏省光伏工程技术中心,无锡,214082 |
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| 基金项目： | 江苏省高技术招标项目，江苏省六大人才高峰项目，信息产业部电子信息产业发展基金 |
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| 摘 要： | 采用磁控溅射技术在不同溅射功率下制备了ZnO薄膜.研究了薄膜的沉积速率、光电特性以及不同功率条件下制备的ZnO薄膜对HIT电池开路电压的影响.结果表明:在溅射功率为200 W时制备的薄膜,具有良好的导电性和光透过性;将其应用到HIT电池中,得到的开路电压最高.该研究对提高HIT电池性能具有一定的参考意义.
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| 关 键 词： | 磁控溅射 ZnO薄膜 沉积速率 光电特性 HIT太阳电池 |
Effects of the Sputtering Power on the Photoelectric Properties of ZnO Transparent Conductive Oxide Thin Films |
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| CHEN Xiao-jing,WANG Yong-qian,ZHU Tuo,LI Guo-hua,ZHANG Guang-chun.Effects of the Sputtering Power on the Photoelectric Properties of ZnO Transparent Conductive Oxide Thin Films[J].Journal of Synthetic Crystals,2009,38(2):354-357. |
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| Authors: | CHEN Xiao-jing WANG Yong-qian ZHU Tuo LI Guo-hua ZHANG Guang-chun |
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| Institution: | 1.School of Science;Jiangnan University;Wuxi 214122;China;2.Research and Development Center;Suntech Power Co.;Ltd;Wuxi 214028;3.Jiangsu Photovoltaic Engineering and Technical Center;China |
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| Abstract: | ZnO transparent conductive oxide thin films were deposited by radio-frequency magnetron sputtering technique at different sputtering powers. The effect of the sputtering powers on the growth rate, photoelectric properties of these films and the open circuit voltage of HIT solar cells were studied. The results show that the resistivity and optical transmittance of the film deposited at sputtering power of 200 W are good. With this film, the highest open circuit voltage was get for HIT solar cells. The resear... |
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| Keywords: | magnetron sputtering ZnO thin film growth rate photoelectric properties HIT solar cell |
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