Structure and reactivity of mixed omega-carboxyalkyl/alkyl monolayers on silicon: ATR-FTIR spectroscopy and contact angle titration |
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Authors: | Liu Yong-Jun Navasero Neenah M Yu Hua-Zhong |
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Affiliation: | Department of Chemistry, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada. |
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Abstract: | The structure, reactivity, and acid-base properties of mixed monolayers prepared by photochemical reaction of hydrogen-terminated silicon with mixtures of ethyl undecylenate and n-alkenes were studied by ATR-FTIR spectroscopy and contact-angle measurements. The surface composition of the mixed monolayers and its correlation with the hydrolysis reactivity of terminal ethoxycarbonyl (ester) groups were investigated by systematically varying the mole fraction of ethyl undecylenate and the chain length of the unsubstituted alkenes in the binary deposition solution. It has been shown that the mole fraction of ester groups on the surface deviates only slightly from the mole fraction of ethyl undecylenate in the solution. The efficiency of ester hydrolysis under acidic conditions is significantly influenced by the monolayer structure, i.e., the surface density of ester groups and length of the unsubstituted alkyl chains. In addition, we find that mixed omega-alkanoic acid/alkyl monolayers on silicon (prepared via hydrolysis) exhibit well-defined contact angle titration curves from which the surface acid dissociation constants were determined. The results were compared with the acid-base properties reported in the literature for carboxylic acid-terminated alkylsiloxane monolayers on hydroxylated silicon and for omega-mercaptoalkanoic acid/alkanethiolate monolayers on gold. The weak pKa dependence (deltapKa approximately 1) on the surface density of carboxylic acid groups and on the length of unsubstituted alkyl chains is attributed to variations of the microenvironment of the acid moieties. These experimental findings provide fundamental knowledge at the molecular level for the preparation of bioreactive surfaces of controlled reactivity on crystalline semiconductor substrates. |
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