Synthesis and characterization of chemically grown electrochromic tungsten oxide |
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| Authors: | R. R. Kharade S. R. Mane R. M. Mane P. S. Patil P. N. Bhosale |
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| Affiliation: | (1) Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur, 416004, India;(2) Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur, 416004, India; |
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| Abstract: | Tungsten oxide thin films, which are cathodic coloration materials that are used in electrochromic devices, were prepared by a chemical growth method and their electrochromic properties were investigated. The thin films of WO3 were deposited onto electrically conducting substrates: fluorine doped tin oxide coated glass (FTO) with sheet resistance of about 10 Ω/cm. Transparent, uniform and strongly adherent thin film samples of WO3 were studied for their structural, morphological, optical and electrochromic properties. The XRD data confirmed the monoclinic crystal structure of WO3 thin films. The direct band gap Eg for the films was found to be 2.95 eV which is good for electrochromic device application. The electrochromism of WO3 thin film was evaluated in 0.5 M LiClO4/propylene carbonate for Li+ intercalation. Electrochromic properties of WO3 thin films were studied with the help of Cyclic Voltammetry (CV), Chronoamperometry (CA) and Chronocoulometry (CC) techniques. |
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