首页 | 本学科首页   官方微博 | 高级检索  
     


Auger electron microscopy: An overview
Authors:L. Frank  M. M. El Gomati
Affiliation:(1) Institute of Scientific Instruments, Czech Acad. Sci., Královopolská 147, 61264 Brno, Czech Republic;(2) The Electronics Department, University of York, YO1 5DD Heslington, York, UK
Abstract:The aim of Auger electron imaging is to obtain quantitative surface elemental distribution maps at high spatial resolution. The realization of this goal is complicated by many instrumental effects and by spurious data processing contributions giving rise to an image contrast unrelated to the specimen surface composition. The critical properties of scanning Auger microscopy that may cause such a false information or imaging artefacts are reviewed. Instrumental or data processing related effects appear in the case of the beam current variation, of the background slope effect, and of the use of a combined peak to background ratio. The second set of artefacts are mainly due to the significant differences between the penetration depth of the exciting primary electrons and the escape depth of the Auger electron signal. In this case the net effect is a surface elemental contrast which is dominated by the substrate or by the overlayer rather than by the surface under investigation. In addition, there are also topographical effects of the specimen under test which normally affect the Auger yield and hence the contrast in the image. Methods for the successful suppression of some of these artefacts are outlined. They are based on the creation of reference images from complementary signals acquired by additional detection channels in parallel with the Auger signal of interest.Invited lecture presented at the Seminar on Secondary Electrons in Electron Spectroscopy, Microscopy, and Microanalysis, Chlum (The Czech Republic), 21–24 September 1993.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号