High performance IGZO/TiO2 thin film transistors using Y2O3 buffer layers on polycarbonate substrate |
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Authors: | H H Hsu C Y Chang C H Cheng |
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Institution: | 1. Department of Electronics Engineering, National Chiao Tung University, Hsinchu, 300, Taiwan 2. Department of Mechatronic Technology, National Taiwan Normal University, Taipei, 106, Taiwan
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Abstract: | In this work, we fabricate IGZO TFT devices on flexible substrate at room temperature. The IGZO/TiO2 TFT has small subthreshold swing of 0.16 V/dec, but suffers large gate leakage and negative threshold voltage. However, the TiO2 TFT with Y2O3 buffer layers shows improved characteristics including a low threshold voltage of 0.55 V, a small sub-threshold swing of 0.175 V/decade and high field-effect mobility of 43 cm2/Vs. Such good performance can be attributed to the enhanced capacitance density and lowered gate leakage owing to the integration of large band gap Y2O3 and low-temperature higher-κ TiO2. |
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