Atomic-layer deposition of thin titanium dioxide films from tetramethoxytitanium and water |
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| Authors: | A P Alekhin A M Markeev D V Ovchinnikov A A Solov’ev V F Toknova |
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| Institution: | 1618. Moscow Institute of Physics and Technology (State University), Dolgoprudnyi, Moscow oblast, Russia
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| Abstract: | Comparative analysis of atomic-layer deposition of titanium dioxide in precursor systems Ti(OCH3)4-H2O and Ti(OC2H5)4-H2O demonstrated that the growth rate of titanium dioxide produced by atomic-layer deposition in the Ti(OCH3)4-H2O system can be adequately estimated using a model taking into account the number and size of ligands in the metal-containing precursor. Studies in simulated body fluids demonstrated that polycrystalline anatase TiO2 coatings are capable of accelerated osteointegration, which makes this precursor promising for development of new biomedical articles. |
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