The Analytical Evaluation of Projection Optical Lithography

We earlier proposed an analytical and prospective method for evaluating projection optical lithography. In this paper, we apply it to more complicated cases, such as optimizing transparency of a half tone phase-shifting mask and considering the resolution enhancement technique which uses both multiple exposure and non-linear resist. We also apply it to the evaluation of isolated line patterns using 1:2 line-and-space patterns.Presented at the International Commission for Optics Topical Meeting, Kyoto, 1994.