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Electron channelling contrast imaging of dislocations in a conventional SEM
Authors:Bo Pang  I. P. Jones  Yu-Lung Chiu  J. C. F. Millett  Glenn Whiteman
Affiliation:1. School of Metallurgy and Materials, University of Birmingham, Birmingham, UKpangb@bham.ac.uk;3. School of Metallurgy and Materials, University of Birmingham, Birmingham, UK;4. AWE, Aldermaston, Reading, UK
Abstract:Abstract

Dislocations in shock loaded tantalum single crystals were imaged using both transmission electron microscope (TEM) and electron channelling contrast image (ECCI) in a scanning electron microscope with a conventional backscattered electron detector. The results were compared with backscattered electron intensity profiles across dislocations calculated via the dynamic theory of electron diffraction. A one-to-one correspondence between ECCI and TEM is established. High voltage and low index reflections should be used to obtain the highest dislocation contrast and greatest imaging depth.
Keywords:Electron channelling  electron microscopy  dislocations  tantalum  computer simulation  crystal defects  defect analysis
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