Comparison of the X-ray photoelectron and electron-energy-loss spectra of the nitrogen-doped hydrogenated amorphous carbon bond |
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Authors: | D A Zeze S R P Silva S Haq S J Harris |
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Institution: | 1. Advanced Technology Institute , University of Surrey , Guildford, GU2 7XH, UK;2. Advanced Technology Centres-Sowerby , BAE Systems , Filton FPCH267, Bristol, BS34 7QW, UK |
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Abstract: | The composition of nitrogen-doped hydrogenated amorphous carbon (a-C : H : N) films grown in a magnetically confined rf plasma-enhanced chemical vapour deposition system has been determined by X-ray photoelectron spectroscopy (XPS) and compared with that determined using a combination of elastic recoil detection analysis, Rutherford back-scattering and nuclear reaction analysis. The importance of nitrogen doping or 'incorporation' in hydrogenated amorphous carbon (a-C : H) films is discussed in relation to the significant variation in the sp 2 -to-sp 3 ratio that takes place. At 7 at.% N in the a-C : H matrix, a critical change in the microstructure is observed, which governs the resulting mechanical, optical and electronic properties. Finally, the correlation between the sp 2 and sp 3 fractions determined by a non-destructive method of obtaining the bond fractions (XPS) and by electron-energy-loss spectroscopy is discussed, with a view to evaluating accurately the sp 2 fraction in a-C : H : N films. |
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