Effects of oxygen content on the microstructures and optical properties of thermochromic vanadium oxide thin films |
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| Authors: | Zhenfei Luo Tao Wang Weizhi Li Yadong Jiang |
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| Affiliation: | 1. School of Optoelectronic Information, State Key Laboratory of Electronic Thin Films and Integrated Devices , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , China zhfluo@yahoo.com.cn;3. School of Optoelectronic Information, State Key Laboratory of Electronic Thin Films and Integrated Devices , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , China |
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| Abstract: | Reactive direct current magnetron sputtering and in situ thermal oxidation were used to prepare vanadium oxide (VO X ) thin films with different oxygen contents. X-ray diffraction, Fourier transform infrared spectroscopy and a field emission scanning electron microscope were employed to characterize the films. The optical properties of the VO X films at room temperature and 90 °C were investigated by applying an spectroscopic ellipsometer with a three-layer model of BEMA/Brendel–Bormann oscillator/substrate. It was demonstrated that the vanadium–oxygen bonds were strengthened, the film thickness and roughness decreased, while the grain size increased with increasing oxygen content. The increase in oxygen content had the effect of decreasing the near-infrared reflectance and free-electron concentration of the film at 90°C due to the decrease in the amount of VO2. |
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| Keywords: | vanadium oxide thin film oxygen content microstructure optical property |
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